Structure and Properties of Metallic SnZn Alloy Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition
Abstract
Thin (50-300 nm) metallic SnZn alloy films were prepared from tetramethyltin and diethylzinc by a plasma-enhanced metalorganic chemical vapor deposition process. The deposition temperature varied from 25 to 180°C. Compositions (Zn:Sn atomic ratio) of the resulting alloy films were controlled by carefully adjusting the monomer flow rate ratios. The structure and properties of the resulting SnZn films are found to be greatly influenced by the substrate temperature. The film deposition rate decreases with the temperature, whereas the grain size and the sheet conductivity of the films increase as the temperature increases. Zinc-rich films obtained at high flow rate and low temperatures, 25°C, are found to possess high internal stresses and are unstable when exposed to air. Incorporation of carbon impurities into the deposited films plays an important role in determining the grain structure and sheet conductivity of the plasma-formed SnZn films. © 1989.
Recommended Citation
T. J. Lin et al., "Structure and Properties of Metallic SnZn Alloy Films Prepared by Plasma-enhanced Metalorganic Chemical Vapor Deposition," Thin Solid Films, Elsevier, Jan 1989.
The definitive version is available at https://doi.org/10.1016/0040-6090(89)90575-0
Department(s)
Materials Science and Engineering
Second Department
Chemistry
International Standard Serial Number (ISSN)
0040-6090
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1989 Elsevier, All rights reserved.
Publication Date
01 Jan 1989
