Thermochemical Nitridation of Microporous Silica Films in Ammonia
Microporous silicon dioxide thin films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high-temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents.
R. K. Brow and C. G. Pantano, "Thermochemical Nitridation of Microporous Silica Films in Ammonia," Journal of the American Ceramic Society, American Chemical Society (ACS), Jan 1987.
The definitive version is available at https://doi.org/10.1111/j.1151-2916.1987.tb04845.x
Materials Science and Engineering
International Standard Serial Number (ISSN)
Article - Journal
© 1987 American Chemical Society (ACS), All rights reserved.
01 Jan 1987