Atomic-scale Chemical and Electronic Structure Studies of Well-defined Metal Oxide Surfaces
Recent significant strides have been made on the development of available techniques that can be used to investigate the interfacial activity of reactions occurring at well-defined metal oxide interfaces. MIES/UPS has been an especially useful technique for elucidating geometric molecular orientation of molecules as they adsorb onto the metal oxide; the high surface sensitivity of the probe (in conjunction with TPD) can be exploited to quantitate near-surface defects and its effects on molecular adsorption. STM and STS has been shown to be particularly effective in monitoring the admetal cluster size and electronic structure effects on model planar oxide catalyst systems, showing a correlation of relative activity with these properties. Further advances have been made in gaining insight on the nature of the CO bond to these highly reactive systems and further extended into the study of mixed metal oxide systems using IRAS, LEED and TPD. In the area of scanning probe microscopy, progress has been made in bridging the pressure gap for obtaining atomic-resolution images at realistic catalytic reaction conditions. These tools will play an important role in the frontier areas of surface science, permitting us to monitor molecular-level interactions in order to control the size, structure and spatial distribution of adsorbed admetal particles and/or reactants (e.g. NO, CO) on oxides for the rational design of chemically active surfaces. © 2001 Elsevier B.V. All rights reserved.
C. C. Chusuei et al., "Atomic-scale Chemical and Electronic Structure Studies of Well-defined Metal Oxide Surfaces," Chemical Physics of Solid Surfaces, Elsevier, Jan 2001.
The definitive version is available at https://doi.org/10.1016/S1571-0785(01)80029-8
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© 2001 Elsevier, All rights reserved.
01 Jan 2001