Electrodeposition of Nanomodulated Ceramic Thin Films
Electrochemistry can be used for the atomic-level architecture of ceramic materials. in this report, ceramic superlattices based on the TlaPbbOc/TldPbeOf system were electrodeposited with individual layer thicknesses as thin as 3nm. the superlattices were deposited from a single aqueous solution at room temperature, and the layer thicknesses were galvanostatically controlled. Substitution of Ti2O3 into PbO2 appears to stabilize a face-centered cubic structure with an average lattice parameter of 0.536nm. the lattice parameters for the T1aPbbOc. mixed oxides vary by less than 0.3% when the Pb/Ti ratio is varied from 0.84 to 7.3. Because the modulation wavelengths are of electron mean free path dimensions, this new class of degenerate semiconductor metal-oxide superlattices may show thickness-dependent quantum optical, electronic, or optoelectronic effects.
J. A. Switzer et al., "Electrodeposition of Nanomodulated Ceramic Thin Films," Materials Research Society Symposium - Proceedings, Cambridge University Press, Jan 1990.
The definitive version is available at https://doi.org/10.1557/PROC-180-1053
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© 1990 Cambridge University Press, All rights reserved.
01 Jan 1990