Estimation Of Reproducibility Of Plasma Polymerization By Infrared And X-ray Photoelectron Spectroscopy
Using an inductively coupled radiofrequency (RF) discharge system which is suitable for reproducibility study because of its easiness of adjusting plasma conditions, tetramethyldisiloxane (I) and tetrafluoroethylene (II) plasma polymerizations were studied by IR and ESCA for estimating influences of operation parameters such as RF wattage supplied to the system during a reaction run. As substrates for plasma polymer deposition, KBr or NaCl fine powders were used and proved effective to make tabulets giving improved and reproducible IR spectra. Methyl/siloxane group ratio in (I) plasma polymer could be compared by the technique and observed to reach minimum level already at 50 W and then be kept almost constant at higher wattages, indicating substantial formation of SiC bonds in plasma in addition to claevage. In (II) plasma system, intense glass ablation by plasma leads to form a variety of fluorosilicates on substrates by IR measurement, reflecting the etching capability. According to deconvolution analysis of ESCA C18 peaks, the polymer structure seemed not to be always altered with change of plasma character suggested by IR spectra. © 1981, The Society of Polymer Science, Japan. All rights reserved.
T. Masuoka and H. Yasuda, "Estimation Of Reproducibility Of Plasma Polymerization By Infrared And X-ray Photoelectron Spectroscopy," KOBUNSHI RONBUNSHU, vol. 38, no. 10, pp. 687 - 692, J-Stage, Jan 1981.
The definitive version is available at https://doi.org/10.1295/koron.38.687
Keywords and Phrases
ESCA; Infrared; Plasma Polymerization; Reproducibility; RF Glow Discharge; Spectroscopy; Tetrafluoroethylene; Tetramethyldisiloxane
International Standard Serial Number (ISSN)
Article - Journal
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01 Jan 1981