Electrodeposition of Nanomodulated Electronic Ceramic Thin Films
Electrochemistry can be used for the atomic-level architecture of ceramic materials. In this report, ceramic superlattices based on the TlaPbbOc/TldPbeOf system were electrodeposited with individual layer thicknesses as thin as 3 nm. The superlattices were deposited from a single aqueous solution at room temperature, and the layer thicknesses were galvanostatically controlled. Substitution of Tl2O3 into PbO2 appears to stabilize a face-centered cubic structure with an average lattice parameter of 0.536 nm. The lattice parameters for the TlaPbbOc mixed oxides vary by less than 0.3% when the Pb/Tl ratio is varied from 0.84 to 7.3. Because the modulation wavelengths are of electron mean free path dimensions, this new class of degenerate semiconductor metal-oxide superlattices may show thickness-dependent quantum optical, electronic, or optoelectronic effects.
J. A. Switzer, "Electrodeposition of Nanomodulated Electronic Ceramic Thin Films," National Institute of Standards and Technology (NIST) Special Publication 804, pp. 185-192, United States. Department of Commerce, Jan 1991.
International Conference on the Chemistry of Electronic Ceramic Materials (1990: Aug. 17-22, Jackson, WY)
Keywords and Phrases
Oxides - Mixing; Semiconductor Materials - Optical Properties; Electrodeposition; Metal Oxide Superlattices; Modulated Structures; Nanomodulated Electronic Ceramic Films; Ceramic Materials
Article - Journal
© 1991 United States Department of Commerce, All rights reserved.
01 Jan 1991