Surface Modification of Catalysts Via Atomic Layer Deposition for Pollutants Elimination


In recent years, atomic layer deposition (ALD) is widely used for surface modification of materials to improve the catalytic performance for removing pollutants, e.g., CO, hydrocarbons, heavy metal ions, and organic pollutants, and much progress has been achieved. In this review, we summarize the recent development of ALD applications in environmental remediation from the perspective of surface modification approaches, including conformal coating, uniform particle deposition, and area-selective deposition. Through the ALD conformal coating, the activity of photocatalysts improved. Uniform particle deposition is used to prepare nanostructured catalysts via ALD for removal of air pollutions and dyes. Area-selective deposition is adopted to cover the specific defects on the surface of materials and synthesize bimetallic catalysts to remove CO and other contaminations. In addition, the design strategy of catalysts and shortcomings of current studies are discussed in each section. At last, this review points out some potential research trends and comes up with a few routes to further improve the performance of catalysts via ALD surface modification and deeper investigate the ALD reaction mechanisms.


Chemical and Biochemical Engineering

Research Center/Lab(s)

Intelligent Systems Center


This work was funded by the National Natural Science Foundation of China (No. 22002010), and Natural Science Foundation of Liaoning Province of China (Joint Foundation for Shipping: No. 2020-HYLH-23).

Keywords and Phrases

Area-selective deposition; Atomic layer deposition (ALD); Conformal coating; Pollutants removal; Uniform particle deposition

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Article - Journal

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Final Version

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Publication Date

10 Nov 2020