XPS Characterization of Beryllium Carbide Thin Films Formed via Plasma Deposition
Abstract
Beryllium carbide thin films were deposited onto selected substrates. Such films may serve as inertial confinement fusion target coatings and have potential for magnetic fusion reactors. The films were characterized by X-ray photoelectron spectroscopy (XPS) and four-point probe electrical conductivity measurement (FPPM) among others. XPS analyses established that: (1) beryllium carbide is the dominant chemical composition (2) atomic Be in excess of stoichiometric carbide is dispersed within a carbide matrix and small amount of carbon is present (3) increasing charging shifts in the XPS spectra with decreasing Be content suggests higher electrical resistivity in these films which is confirmed by FPPM of film electrical conductivity.
Recommended Citation
Y. Xie et al., "XPS Characterization of Beryllium Carbide Thin Films Formed via Plasma Deposition," Journal of Nuclear Materials, Elsevier, Jan 2001.
The definitive version is available at https://doi.org/10.1016/S0022-3115(00)00682-6
Department(s)
Chemical and Biochemical Engineering
Second Department
Chemistry
International Standard Serial Number (ISSN)
0022-3115
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2001 Elsevier, All rights reserved.
Publication Date
01 Jan 2001
