Abstract
Fabricating metasurfaces over large areas at low costs remains a critical challenge to their practical implementation. This paper reports on the use of microsphere photolithography (MPL) to create infrared metasurfaces by changing the angle-of-incidence of the illumination to steer the photonic jet. The displacement of the photonic jet is shown to scale with the diameter of the microsphere while the exposure dose scales with the square of the microsphere diameter. This process is robust in the presence of local defects in the microsphere lattice. The paper demonstrates patterning split ring resonators and tripole based metasurfaces using MPL, which are fabricated and characterized with FTIR. The combination of bottom-up and top-down approaches in off-normal incidence microsphere photolithography technique provides cost-effective, flexible, and high-throughput fabrication of infrared metasurfaces.
Recommended Citation
C. Qu and E. C. Kinzel, "Infrared Metasurfaces Created with Off-Normal Incidence Microsphere Photolithography," Optics Express, vol. 25, no. 11, pp. 12632 - 12639, Optical Society of America (OSA), May 2017.
The definitive version is available at https://doi.org/10.1364/OE.25.012632
Department(s)
Mechanical and Aerospace Engineering
Keywords and Phrases
Cost effectiveness; Fourier transform infrared spectroscopy; Photolithography; Angle of Incidence; Bottom-up and top-down; Cost effective; Critical challenges; Exposure dose; High throughput; Normal incidence; Split ring resonator; Microspheres
International Standard Serial Number (ISSN)
1094-4087
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2017 Optical Society of America (OSA), All rights reserved.
Publication Date
01 May 2017
Comments
National Science Foundation (NSF ECCS-1509589); Missouri University of Science and Technology Materials Research Center.