Modeling the Nucleation and Growth Behavior of Solution Derived Thin Films
Abstract
A model for the prediction of microstructural evolution of solution derived thin films has been developed. The model is based on standard nucleation and growth rate expressions that have been used previously to explain transformation behavior in amorphous materials. A Basic program was written incorporating these standard analytical expressions and known material properties, such as lattice constants, moduli, and melting point, as well as calculated thermodynamic parameters, such as the volume free energy. The output of the model gives a visualization of the thin film microstructure for different boundary conditions, including substrate type, lattice matching with the film, processing temperature, and time. The utility of the model is demonstrated through comparison with experimentally obtained results for yttria-stabilized zirconia and lead zirconate titanate thin films.
Recommended Citation
R. W. Schwartz and H. D. Dobberstein, "Modeling the Nucleation and Growth Behavior of Solution Derived Thin Films," Proceedings of the 1st Symposium on Advanced Materials for Next Generation, National Institute of Advanced Industrial Science and Technology, May 2002.
Department(s)
Materials Science and Engineering
Sponsor(s)
Sandia Laboratories
Keywords and Phrases
Growth; Modeling; Nucleation; Sol-Gel; Solution Deposition; Substrate; Transformation
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2002 National Institute of Advanced Industrial Science and Technology, All rights reserved.
Publication Date
01 May 2002
