Masters Theses

Keywords and Phrases

Lithography; Risk; Semiconductor

Abstract

The purpose of this thesis is to present a methodology to identify risks in the chemical product development process, including fortification of the failure mode taxonomy by including chemical failures. This work will enable comprehensive risk analysis in technology-based products that have a chemical based subsystem, such as those used in the lithography process in the semiconductor industry. This research broadened the failure mode taxonomy by identifying chemical failures from publications in the semiconductor industry. These failures were analyzed to determine the rudimentary failure modes in each case. The newly identified failure modes were added to the failure mode taxonomy. The taxonomy was then verified by generating potential risks of a chemical based product through the use of a case study. The case study analysis verified the research by producing the failure mode listed in the publication.

Advisor(s)

Grantham Lough, Katie, 1979-

Committee Member(s)

Dow, Benjamin Lloyd
Murray, Susan L.

Department(s)

Engineering Management and Systems Engineering

Degree Name

M.S. in Engineering Management

Publisher

Missouri University of Science and Technology

Publication Date

Fall 2012

Pagination

ix, 47 pages

Note about bibliography

Includes bibliographical references.

Rights

© 2012 Carlton Ashley Washbur, All rights reserved.

Document Type

Thesis - Open Access

File Type

text

Language

English

Subject Headings

Product design
Semiconductor industry -- Risk management
Photolithography

Thesis Number

T 10105

Electronic OCLC #

828860530

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