Abstract
With the recent development of nanoscale materials and assembly techniques, it is envisioned to build high-density reconfigurable systems which have never been achieved by the photolithography. Various reconfigurable architectures have been proposed based on nanowire crossbar structure as the primitive building block. Unfortunately, high-density systems consisting of nanometer-scale elements are likely to have many imperfections and variations; thus, defect-tolerance is considered as one of the most exigent challenges. In this paper, we evaluate three different logic mapping algorithms with defect avoidance to circumvent clustered defective crosspoints in nanowire reconfigurable crossbar architectures. The effectiveness of inherited redundancy and configurability utilization is demonstrated through extensive parametric simulations.
Recommended Citation
Y. Yellambalase et al., "Inherited Redundancy and Configurability Utilization for Repairing Nanowire Crossbars with Clustered Defects," Proceedings of the 21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (2006, Arlington, VA), pp. 98 - 106, IEEE Computer Society, Oct 2006.
The definitive version is available at https://doi.org/10.1109/DFT.2006.37
Meeting Name
21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (2006: Oct. 4-6, Arlington, VA)
Department(s)
Electrical and Computer Engineering
Keywords and Phrases
Algorithms; Computer Simulation; Crossbar Equipment; Defects; Photolithography; Redundancy, Defect-Tolerance; Nanometer-Scale Elements; Nanowire Crossbar Structure; Reconfigurable Systems; Nanowires
International Standard Book Number (ISBN)
978-0769527062
International Standard Serial Number (ISSN)
1550-5774; 2377-7966
Document Type
Article - Conference proceedings
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2006 IEEE Computer Society, All rights reserved.
Publication Date
01 Oct 2006
