Recent Progress in 193 Nm Antireflective Coatings
Abstract
This paper presents the chemistries and properties of organic, spin-on, bottom antireflective coatings (BARCs) that are designed for 193 nm lithography. All of the BARCs are thermosetting and use dye-attached/incorporated polymers. A first generation product, NEXT, will soon be commercialized. NEXT is built from i-line and deep-UV chemistries with the polymeric constituent being a substituted novolac. This product provides outstanding resolution of 0.16 μm L/S with several 193 nm photoresists. Second generation chemical platforms under study include acrylics, polyesters, and polyethers with the 193 nm absorbing chromophore being an aromatic function. The performance of selected BARCs from the four platforms is described, including: optical properties, 193 nm litho, plasma etch rates, Prolith modeling data, spin-bowl and waste line compatibility, and ambient stability.
Recommended Citation
J. D. Meador et al., "Recent Progress in 193 Nm Antireflective Coatings," Proceedings of SPIE - The International Society for Optical Engineering, SPIE -- The International Society for Optical Engineering, Jan 1999.
The definitive version is available at https://doi.org/10.1117/12.350269
Meeting Name
Proceedings of SPIE - The International Society for Optical Engineering (1999, Santa Clara, CA)
Department(s)
Chemistry
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1999 SPIE -- The International Society for Optical Engineering, All rights reserved.
Publication Date
01 Jan 1999
