Abstract

LiMn1.5Ni0.5O4 (LMNO) has a huge potential for use as a cathode material in electric vehicular applications. However, it could face discharge capacity degradation with cycling at elevated temperatures due to attacks by hydrofluoric acid (HF) from the electrolyte, which could cause cationic dissolution. To overcome this barrier, we coated 3-5 micron sized LMNO particles with a ∼3 nm optimally thick and conductive CeO2 film prepared by atomic layer deposition (ALD). This provided optimal thickness for mass transfer resistance, species protection, and mitigation of cationic dissolution at elevated temperatures. After 1,000 cycles of chargedischarge between 3.5 V-5 V (vs. Li+/Li) at 55°C, the optimally coated sample, 50Ce (50 cycles of CeO2 ALD coated) had a capacity retention of ∼97.4%, when tested at a 1C rate, and a capacity retention of ∼83% at a 2C rate. This was compared to uncoated LMNO particles that had a capacity retention of only ∼82.7% at a 1C rate, and a capacity retention of ∼40.8% at a 2C rate.

Meeting Name

18th International Meeting on Lithium Batteries (2016: Jun. 19-24, Chicago, IL)

Department(s)

Chemical and Biochemical Engineering

Comments

This work was supported in part by the National Science Foundation grant NSF DMR 1464111 and the Energy Research and Development Center (ERDC) at Missouri University of Science and Technology.

Keywords and Phrases

Cathodes; Dissolution; Electric Discharges; Electrodes; Electrolytes; Hydrofluoric Acid; Lithium Compounds; Mass Transfer; Nickel; Capacity Retention; Cathode Materials; Discharge Capacities; Electrochemical Performance; Elevated Temperature; Mass Transfer Resistances; Optimal Thickness; Vehicular Applications; Atomic Layer Deposition

International Standard Serial Number (ISSN)

0013-4651; 1945-7111

Document Type

Article - Conference proceedings

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2017 Electrochemical Society, All rights reserved.

Creative Commons Licensing

Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 License.

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