Amorphization Of Silicon By Ion Implantation: Homogeneous Or Heterogeneous Nucleation?

Author

J. R. Dennis
Edward Boyd Hale, Missouri University of Science and TechnologyFollow

Recommended Citation

J. R. Dennis and E. B. Hale, "Amorphization Of Silicon By Ion Implantation: Homogeneous Or Heterogeneous Nucleation?," Radiation Effects, vol. 30, no. 4, pp. 219 - 225, Taylor and Francis Group, Jan 1976.

The definitive version is available at https://doi.org/10.1080/00337577608240825

Department(s)

Physics

Comments

Research Corporation for Science Advancement, Grant None

International Standard Serial Number (ISSN)

0033-7579

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2023 Taylor and Francis Group, All rights reserved.

Publication Date

01 Jan 1976