Application of Higher-Order FEM Elements to the Analysis of Microstrip Structures

H. Wang
Todd H. Hubing, Missouri University of Science and Technology
James L. Drewniak, Missouri University of Science and Technology
Richard E. DuBroff, Missouri University of Science and Technology
C. L. Guo
Thomas Van Doren, Missouri University of Science and Technology

This document has been relocated to http://scholarsmine.mst.edu/ele_comeng_facwork/895

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Abstract

Microstrip structures, formed by metal traces printed on a dielectric substrate above a reference plane, are frequently the object of electromagnetic modeling. In this paper, hybrid FEM/MoM formulations employing conventional Whitney elements and newly developed linear-tangent/linear-normal (LT/LN) tangential vector finite elements (TVFEs) are applied to the analysis of microstrip structures with thin traces. This paper shows that the variation of the electric field below the trace is a significant issue to be addressed in microstrip structure modeling. Different mesh methods are investigated and the advantages of the LT/LN TVFEs are discussed.