Femtosecond Laser-induced Silicon Surface Morphology in Water Confinement

Abstract

This article investigates the use of femtosecond laser induced surface morphology on silicon wafer surface in water confinement. Unlike irradiation of silicon surfaces in the air, there are no laser induced periodic structures, but irregular roughness is formed when the silicon wafer is ablated under water. The unique discovery of a smoothly processed silicon surface in water confinement under certain laser parameter combinations may help improve laser direct micromachining surface quality in industrial applications.

Department(s)

Electrical and Computer Engineering

Second Department

Mechanical and Aerospace Engineering

Keywords and Phrases

Femtosecond Laser; Laser Induced Periodic Structures; Laser Parameters; Lasers; Morphology; Pulsed Laser Applications; Semiconducting Silicon Compounds; Silicon Surface Morphology; Silicon Surfaces; Silicon Wafers; Silicon Water Surfaces; Surface Morphology; Surface Qualities

International Standard Serial Number (ISSN)

0946-7076

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2009 Springer-Verlag, All rights reserved.

Publication Date

01 Jul 2009

Link to Full Text

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