Correlation between Growth Conditions, Microstructure, and Optical Properties in Pulsed-laser-deposited V₂O₅ Thin Films
V₂O₅ thin films were prepared by pulsed laser deposition (PLD) over a wide substrate temperature range, 30-500 °C, and were characterized by studying their microstructure and optical properties. Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and UV-vis-NIR spectral measurements were made on the PLD V₂O₅ films to understand the effect of substrate temperature on the chemical composition, elemental distribution, surface morphology, and optical properties. the substrate temperature strongly influences the structure and optical properties of PLD V₂O₅ films and a correlation exists between the growth conditions, grain structure, and optical characteristics.The grain size increased, associated with a change in surface morphology, with increasing substrate temperature. the optical energy band gap of PLD V₂O₅ films is strongly dependent on the substrate temperature and decreased from 2.47 to 2.12 eV with the increase in temperature from 30 to 500 °C.
C. V. Ramana et al., "Correlation between Growth Conditions, Microstructure, and Optical Properties in Pulsed-laser-deposited V₂O₅ Thin Films," Chemistry of Materials, vol. 17, no. 5, pp. 1213-1219, American Chemical Society (ACS), Feb 2005.
The definitive version is available at https://doi.org/10.1021/cm048507m
National Science Foundation (U.S.)
Petroleum Research Fund
International Standard Serial Number (ISSN)
Article - Journal
© 2005 American Chemical Society (ACS), All rights reserved.
01 Feb 2005