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Title: Process development for waveguide chemical sensors with integrated polymeric sensitive layers
Author (s): Amberkar, Raghu
Gao, Zhan
Park, Jongwon
Henthorn, David
Kim, Chang-Soo
Department/Lab Affiliations: Biological Sciences
Chemical & Biological Engineering
Electrical and Computer Engineering
Environmental Research Center
Intelligent Microsystem Laboratory
Keywords: Lithography
Su-8
oxygen sensor
polyethylene glycol
ruthenium
silicone
waveguide
Issue Date: 2008-02
Publisher: Society of Photo-Optical Instrumentation Engineers SPIE
Citation: Amberkar R, Zhan Gao, Jongwon Park, Henthorn DB, Chang-Soo Kim. "Process development for waveguide chemical sensors with integrated polymeric sensitive layers." Proceedings of the SPIE, vol.6886, Feb. 2008, pp. 68860U-1-8.
Abstract: Due to the proper optical property and flexibility in the process development, an epoxy-based, high-aspect ratio photoresist SU-8 is now attracting attention in optical sensing applications. Manipulation of the surface properties of SU-8 waveguides is critical to attach functional films such as chemically-sensitive layers. We describe a new integration process to immobilize fluorescence molecules on SU-8 waveguide surface for application to intensity-based optical chemical sensors. We use two polymers for this application. Spin-on, hydrophobic, photopatternable silicone is a convenient material to contain fluorophore molecules and to pattern a photolithographically defined thin layer on the surface of SU-8. We use fumed silica powders as an additive to uniformly disperse the fluorophores in the silicone precursor. In general, additional processes are not critically required to promote the adhesion between the SU-8 and silicone. The other material is polyethylene glycol diacrylate (PEGDA). Recently we demonstrated a novel photografting method to modify the surface of SU-8 using a surface bound initiator to control its wettability. The activated surface is then coated with a monomer precursor solution. Polymerization follows when the sample is exposed to UV irradiation, resulting in a grafted PEGDA layer incorporating fluorophores within the hydrogel matrix. Since this method is based the UV-based photografting reaction, it is possible to grow off photolithographically defined hydrogel patterns on the waveguide structures. The resulting films will be viable integrated components in optical bioanalytical sensors. This is a promising technique for integrated chemical sensors both for planar type waveguide and vertical type waveguide chemical sensors.
Type: Article - Conference proceedings
text
In Title: Proceeding of SPIE
Copyright Notice: This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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Publisher URL:
http://dx.doi.org/10.1117/12.765237
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titleProcess development for waveguide chemical sensors with integrated polymeric sensitive layers
contributor.authorAmberkar, Raghu
contributor.authorGao, Zhan
contributor.authorPark, Jongwon
contributor.authorHenthorn, David
contributor.authorKim, Chang-Soo
contributor.deptlabBiological Sciences
contributor.deptlabChemical & Biological Engineering
contributor.deptlabElectrical and Computer Engineering
contributor.deptlabEnvironmental Research Center
contributor.deptlabIntelligent Microsystem Laboratory
subjectLithography
subjectSu-8
subjectoxygen sensor
subjectpolyethylene glycol
subjectruthenium
subjectsilicone
subjectwaveguide
date.issued2008-02
publisherSociety of Photo-Optical Instrumentation Engineers SPIE
identifier.citationAmberkar R, Zhan Gao, Jongwon Park, Henthorn DB, Chang-Soo Kim. "Process development for waveguide chemical sensors with integrated polymeric sensitive layers." Proceedings of the SPIE, vol.6886, Feb. 2008, pp. 68860U-1-8.
identifier.pub.URI
http://dx.doi.org/10.1117/12.765237
description.abstractDue to the proper optical property and flexibility in the process development, an epoxy-based, high-aspect ratio photoresist SU-8 is now attracting attention in optical sensing applications. Manipulation of the surface properties of SU-8 waveguides is critical to attach functional films such as chemically-sensitive layers. We describe a new integration process to immobilize fluorescence molecules on SU-8 waveguide surface for application to intensity-based optical chemical sensors. We use two polymers for this application. Spin-on, hydrophobic, photopatternable silicone is a convenient material to contain fluorophore molecules and to pattern a photolithographically defined thin layer on the surface of SU-8. We use fumed silica powders as an additive to uniformly disperse the fluorophores in the silicone precursor. In general, additional processes are not critically required to promote the adhesion between the SU-8 and silicone. The other material is polyethylene glycol diacrylate (PEGDA). Recently we demonstrated a novel photografting method to modify the surface of SU-8 using a surface bound initiator to control its wettability. The activated surface is then coated with a monomer precursor solution. Polymerization follows when the sample is exposed to UV irradiation, resulting in a grafted PEGDA layer incorporating fluorophores within the hydrogel matrix. Since this method is based the UV-based photografting reaction, it is possible to grow off photolithographically defined hydrogel patterns on the waveguide structures. The resulting films will be viable integrated components in optical bioanalytical sensors. This is a promising technique for integrated chemical sensors both for planar type waveguide and vertical type waveguide chemical sensors.
typeArticle - Conference proceedings
type.DCMITypetext
relation.isPartOfProceeding of SPIE
rightsThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
rightsNo full text allowed
rights.URI
http://spie.org/x1126.xml
identifier.persist.URI
http://scholarsmine.mst.edu/post_prints/ProcessDevelopmentForWaveguideChemicalSenso_09007dcc805ec3ac.html
date.available2009-01-29T20:04:23Z