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| Title: | Enhanced wettability of an SU-8 photoresist through a photografting procedure for bioanalytical device applications |
| Author (s): | Gao, Zhan Henthorn, David Kim, Chang-Soo |
| Department/Lab Affiliations: | Biological Sciences Chemical & Biological Engineering Electrical and Computer Engineering Environmental Research Center |
| Keywords: | bioanalytical device hydrogel layer photografting photoinitiator photoresist wettability |
| Issue Date: | 2008-04 |
| Publisher: | Institute of Physics |
| Citation: | Gao, Zhan., Henthorn, David B., and Kim, Chang-Soo. "Enhanced Wettability of SU-8 Photoresist Through a Photografting Procedure for Bioanalytical Device Applications." Journal of Micromechanics and Microengineering, vol. 18, no. 4, 2008. |
| Abstract: | In this work, we detail a method whereby a polymeric hydrogel layer is grafted to negative tone photoresist SU-8 in order to improve its wettability. A photoinitiator is first immobilized on freshly prepared SU-8 samples, acting as the starting point for various surface modification strategies. Grafting of a 2-hydroxyethylmethacrylate-based hydrogel from the SU-8 surface resulted in the reduction of the static contact angle of a water droplet from 79 ± 1◦ to 36 ± 1◦, while addition of a poly(ethylene glycol)-rich hydrogel layer resulted in further improvement (8 ± 1◦). Wettability is greatly enhanced after 30 min of polymerization, with a continued but more gradual decrease in contact angle up to approximately 50 min. Hydrogel formation is triggered by exposure to UV irradiation, allowing for the formation of photopatterned structures using existing photolithographic techniques. |
| Type: | Article - Journal text |
| In Title: | Journal of Micromechanics and Microengineering |
| Copyright Notice: | This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. FULL COPYRIGHT INFORMATION: |
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| title | Enhanced wettability of an SU-8 photoresist through a photografting procedure for bioanalytical device applications |
| contributor.author | Gao, Zhan |
| contributor.author | Henthorn, David |
| contributor.author | Kim, Chang-Soo |
| contributor.deptlab | Biological Sciences |
| contributor.deptlab | Chemical & Biological Engineering |
| contributor.deptlab | Electrical and Computer Engineering |
| contributor.deptlab | Environmental Research Center |
| contributor.sponsor | Intelligent System Center, Missouri, University of Science and Technology |
| contributor.sponsor | National Institute of Environmental Health |
| contributor.sponsor | National Science Foundation |
| subject | bioanalytical device |
| subject | hydrogel layer |
| subject | photografting |
| subject | photoinitiator |
| subject | photoresist |
| subject | wettability |
| date.issued | 2008-04 |
| publisher | Institute of Physics |
| identifier.citation | Gao, Zhan., Henthorn, David B., and Kim, Chang-Soo. "Enhanced Wettability of SU-8 Photoresist Through a Photografting Procedure for Bioanalytical Device Applications." Journal of Micromechanics and Microengineering, vol. 18, no. 4, 2008. |
| identifier.pub.URI | |
| description.abstract | In this work, we detail a method whereby a polymeric hydrogel layer is grafted to negative tone photoresist SU-8 in order to improve its wettability. A photoinitiator is first immobilized on freshly prepared SU-8 samples, acting as the starting point for various surface modification strategies. Grafting of a 2-hydroxyethylmethacrylate-based hydrogel from the SU-8 surface resulted in the reduction of the static contact angle of a water droplet from 79 ± 1◦ to 36 ± 1◦, while addition of a poly(ethylene glycol)-rich hydrogel layer resulted in further improvement (8 ± 1◦). Wettability is greatly enhanced after 30 min of polymerization, with a continued but more gradual decrease in contact angle up to approximately 50 min. Hydrogel formation is triggered by exposure to UV irradiation, allowing for the formation of photopatterned structures using existing photolithographic techniques. |
| type | Article - Journal |
| type.DCMIType | text |
| type.status | Final version |
| rights | This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. |
| rights.URI | |
| relation.isPartOf | Journal of Micromechanics and Microengineering |
| date.accessioned | 2008-05-20T20:04:55Z |
| date.available | 2008-05-30T19:41:05Z |
| identifier.persist.URI |