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Title: Electrodeposition of nanometer-thick ceria films by oxidation of cerium(III)-acetate
Author (s): Switzer, Jay A.
Department/Lab Affiliations: Chemistry
Materials Research Center
Materials Science & Engineering
Keywords: Ceria
Electrodeposition
Films
Nanocrystalline
Issue Date: 2007
Publisher: Elsevier
Citation: Elizabeth A. Kulp, Steven J. Limmer, Eric W. Bohannan and Jay A. Switzer. Electrodeposition of nanometer-thick ceria films by oxidation of cerium(III) acetate, Solid State Ionics, Vol. 178, 11-12, pp. 749-757, 2007
Abstract: Thin films of ceria were electrodeposited onto Hastelloy substrates by the electrochemical oxidation of Ce(III) acetate complexes. The mode of deposition was dependent on the applied potential. At a potential of + 0.5 V vs. Ag/AgCl, the deposition proceeded by a direct oxidation of Ce(III) to ceria. Films deposited at this potential were smooth and crack-free as observed by SEM. Film thicknesses were determined by X-ray reflectivity and ellipsometry. For a deposition time of 1000 s, the ceria deposited to a thickness of approximately 40 nm and a density of 65%. The deposition exhibited self-limiting growth, with growth rates rapidly decreasing with deposition time. At a higher potential of + 1.1 V vs. Ag/AgCl, the films appear to grow by an indirect mechanism, in which the electrochemical oxidation of water forms O2 which then reacts with Ce(III) to form ceria nanoparticles in the growth solution. It was also shown that nanometer-scale ceria powder could be produced by bubbling the solution with molecular oxygen.
Type: Article
text
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This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
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titleElectrodeposition of nanometer-thick ceria films by oxidation of cerium(III)-acetate
contributorBohannan, Eric
contributorKulp, Elizabeth Ann
contributorLimmer, Steven J.
contributor.authorSwitzer, Jay A.
contributor.deptlabChemistry
contributor.deptlabMaterials Research Center
contributor.deptlabMaterials Science & Engineering
contributor.sponsorNational Science Foundation
contributor.sponsorUnited States Department of Energy
subjectCeria
subjectElectrodeposition
subjectFilms
subjectNanocrystalline
date.issued2007
publisherElsevier
identifier.citationElizabeth A. Kulp, Steven J. Limmer, Eric W. Bohannan and Jay A. Switzer. Electrodeposition of nanometer-thick ceria films by oxidation of cerium(III) acetate, Solid State Ionics, Vol. 178, 11-12, pp. 749-757, 2007
identifier.pub.URI
http://dx.doi.org/10.1016/j.ssi.2007.03.012
description.abstractThin films of ceria were electrodeposited onto Hastelloy substrates by the electrochemical oxidation of Ce(III) acetate complexes. The mode of deposition was dependent on the applied potential. At a potential of + 0.5 V vs. Ag/AgCl, the deposition proceeded by a direct oxidation of Ce(III) to ceria. Films deposited at this potential were smooth and crack-free as observed by SEM. Film thicknesses were determined by X-ray reflectivity and ellipsometry. For a deposition time of 1000 s, the ceria deposited to a thickness of approximately 40 nm and a density of 65%. The deposition exhibited self-limiting growth, with growth rates rapidly decreasing with deposition time. At a higher potential of + 1.1 V vs. Ag/AgCl, the films appear to grow by an indirect mechanism, in which the electrochemical oxidation of water forms O2 which then reacts with Ce(III) to form ceria nanoparticles in the growth solution. It was also shown that nanometer-scale ceria powder could be produced by bubbling the solution with molecular oxygen.
typeArticle
type.DCMITypetext
type.statusPostprint
rightsPre-print: author can archive with restrictions;Restriction: This does not include Cell Press; Post-print: author can archive;
rightsThis material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
rights.URI
http://www.elsevier.com/wps/find/authorsview.authors/authorsrights
date.available2008-07-01T21:45:20Z
identifier.persist.URI
http://scholarsmine.mst.edu/post_prints/ElectrodepositionOfNanometer-thickCeriaFilmsBy_09007dcc80526b00.html