Scholars' Mine
Missouri S&T
Research Repository
Curtis Laws Wilson Library
400 W. 14th Street
Rolla, MO 65409-0060
scholarsmine@mst.edu
| Title: | Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography |
| Author (s): | Meador, Jim D. Beaman, Carol Stroud, Charlyn Lowes, Joyce A. Drain, David |
| Department/Lab Affiliations: | Design Engineering Center Mathematics & Statistics |
| Keywords: | 193-nm microlithography BARC Guerrero, Douglas J. Mercado, Ramil-Marcelo L. Zhu, Zhimin anti-reflective developer-soluble dual-layer immersion |
| Issue Date: | 2008-03 |
| Publisher: | Society of Photo-Optical Instrumentation Engineers SPIE |
| Citation: | Jim D. Meador, Carol Beaman, Charlyn Stroud, Joyce A. Lowes, Zhimin Zhu, Douglas J. Guerrero, and Ramil-Marcelo L. Mercado(2008). Dual-layer dye-filled developer-soluable BARCs for 193-nm litholgraphy. Proceedings of SPIE, Vol. 6923, 69232W |
| Abstract: | A family of dye-filled developer-soluble bottom anti-reflective coatings (BARCs) has been developed for use in 193-nm microlithography. This new dye-filled chemical platform easily provides products covering a wide range of optical properties. The light-sensitive and positive-working BARCs use a transparent polymeric binder and a polymeric dye in a thermally crosslinking formulation, with the cured products then being photochemically decrosslinked prior to development. The cured BARC films are imaged and removed with developer in the same steps as the covering photoresist. Two dye-filled BARCs with differing optical properties were developed via a series of DOEs and then used as a dual-layer BARC stack. Lithography with this BARC stack, using a 193-nm resist, gave 150-nm L/S (1:1). A 193-nm dual-layer BARC stack (gradient optical properties) from the well-established dye-attached family of light-sensitive BARCs also gave 150-nm L/S (1:1) with the same resist. However, the latter provided much improved line shape with no scumming. The targeted application for light-sensitive dual-layer BARCs is high-numerical aperture (NA) immersion lithography where a single-layer BARC will not afford the requisite reflection control. |
| Type: | Article - Conference proceedings text |
| Copyright Notice: | No full text allowed FULL COPYRIGHT INFORMATION: |
| Publisher URL: | |
| Link to this page: |
| title | Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography |
| contributor.author | Meador, Jim D. |
| contributor.author | Beaman, Carol |
| contributor.author | Stroud, Charlyn |
| contributor.author | Lowes, Joyce A. |
| contributor.author | Drain, David |
| contributor.deptlab | Design Engineering Center |
| contributor.deptlab | Mathematics & Statistics |
| subject | 193-nm microlithography |
| subject | BARC |
| subject | Guerrero, Douglas J. |
| subject | Mercado, Ramil-Marcelo L. |
| subject | Zhu, Zhimin |
| subject | anti-reflective |
| subject | developer-soluble |
| subject | dual-layer |
| subject | immersion |
| date.issued | 2008-03 |
| publisher | Society of Photo-Optical Instrumentation Engineers SPIE |
| identifier.citation | Jim D. Meador, Carol Beaman, Charlyn Stroud, Joyce A. Lowes, Zhimin Zhu, Douglas J. Guerrero, and Ramil-Marcelo L. Mercado(2008). Dual-layer dye-filled developer-soluable BARCs for 193-nm litholgraphy. Proceedings of SPIE, Vol. 6923, 69232W |
| identifier.pub.URI | |
| description.abstract | A family of dye-filled developer-soluble bottom anti-reflective coatings (BARCs) has been developed for use in 193-nm microlithography. This new dye-filled chemical platform easily provides products covering a wide range of optical properties. The light-sensitive and positive-working BARCs use a transparent polymeric binder and a polymeric dye in a thermally crosslinking formulation, with the cured products then being photochemically decrosslinked prior to development. The cured BARC films are imaged and removed with developer in the same steps as the covering photoresist. Two dye-filled BARCs with differing optical properties were developed via a series of DOEs and then used as a dual-layer BARC stack. Lithography with this BARC stack, using a 193-nm resist, gave 150-nm L/S (1:1). A 193-nm dual-layer BARC stack (gradient optical properties) from the well-established dye-attached family of light-sensitive BARCs also gave 150-nm L/S (1:1) with the same resist. However, the latter provided much improved line shape with no scumming. The targeted application for light-sensitive dual-layer BARCs is high-numerical aperture (NA) immersion lithography where a single-layer BARC will not afford the requisite reflection control. |
| type | Article - Conference proceedings |
| type.DCMIType | text |
| rights | No full text allowed |
| rights.URI | |
| date.available | 2008-09-19T19:09:55Z |
| identifier.persist.URI |