Microstructure of Thin Iron Carbide Films Prepared in a Glow Discharge
Thin (50-80 nm) iron carbide films were grown on carbon-coated copper grids in an r.f. glow discharge using iron pentacarbonyl and hydrogen as starting materials. The substrate temperatures were varied in the range 200-500 °C. The microstructure and phases present in these films are compared with the corresponding results previously obtained by X-ray diffraction, atomic force microscopy, scanning electron microscopy and Auger electron spectroscopy for thick (200-1100 nm) films grown on glass substrates. Transmission electron microscopy studies show that the 50-80 nm films contain a mixture of phases at all deposition temperatures. Transmission electron micrographs of annealed films and films deposited at high temperatures show a clear indication of grain growth.
H. Siriwardane et al., "Microstructure of Thin Iron Carbide Films Prepared in a Glow Discharge," Thin Solid Films, Elsevier, Jan 1996.
The definitive version is available at http://dx.doi.org/10.1016/0040-6090(95)08174-7
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