Title

Microstructure of Thin Iron Carbide Films Prepared in a Glow Discharge

Abstract

Thin (50-80 nm) iron carbide films were grown on carbon-coated copper grids in an r.f. glow discharge using iron pentacarbonyl and hydrogen as starting materials. The substrate temperatures were varied in the range 200-500 °C. The microstructure and phases present in these films are compared with the corresponding results previously obtained by X-ray diffraction, atomic force microscopy, scanning electron microscopy and Auger electron spectroscopy for thick (200-1100 nm) films grown on glass substrates. Transmission electron microscopy studies show that the 50-80 nm films contain a mixture of phases at all deposition temperatures. Transmission electron micrographs of annealed films and films deposited at high temperatures show a clear indication of grain growth.

Department(s)

Physics

Second Department

Materials Science and Engineering

Third Department

Chemistry

Keywords and Phrases

Annealing; Atomic Force Microscopy; Auger Electron Spectroscopy; Glow Discharges; Grain Growth; High Temperature Effects; Iron Compounds; Microstructure; Scanning Electron Microscopy; Thick Films; Transmission Electron Microscopy; X ray Diffraction; Carbon Coated Copper Grids; Glass Substrates; Substrate Temperature; Thin Iron Carbide Films; Thin Films; Iron Carbide

International Standard Serial Number (ISSN)

0040-6090

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1996 Elsevier, All rights reserved.

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