Preparation of an Iron Nitride Film from a Molecular Tetrairon Nitrido Cluster
The transition metal-main-group atom cluster HFe 4(CO) 12N has been studied as a potential molecular precursor for the production of thin films that contain amorphous iron nitride phases. Films 300-500 Å thick are formed by chemical vapor deposition at 160-180°C on glass substrates. Analysis by X-ray photoelectron spectroscopy shows ≈10% nitrogen and low oxygen and carbon impurities. X-ray diffraction shows the presence of an α-Fe phase. Mössbauer spectoscopy of the purest films confirms the presence of α-Fe and, in agreement with the atomic composition, shows an equally abundant nitride phase which is probably due to γ′-Fe 4N. Mass spectrometric analysis of the gas-phase products shows the presence of CO, which is the major gaseous product in the deposition, but low levels of H 2, NH 3, and CO 2 are also identified as pyrolysis products of HFe 4(CO) 12N. The iron nitride film appears to be very similar to that produced by reactive sputtering of iron in argon in the presence of N 2 and H 2 in a 1:1 ratio. © 1990 American Chemical Society.
T. P. Fehlner et al., "Preparation of an Iron Nitride Film from a Molecular Tetrairon Nitrido Cluster," Chemistry of Materials, American Chemical Society (ACS), Jan 1990.
The definitive version is available at https://doi.org/10.1021/cm00009a015
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© 1990 American Chemical Society (ACS), All rights reserved.