Title

Fast Growth of Graphene Patterns by Laser Direct Writing

Abstract

Rapid single-step fabrication of graphene patterns was developed using laser-induced chemical vapor deposition (LCVD). A laser beam irradiates a thin nickel foil in a CH4 and H2 environment to induce a local temperature rise, thereby allowing the direct writing of graphene patterns in precisely controlled positions at room temperature. Line patterns can be achieved with a single scan without pre- or postprocesses. Surprisingly, the growth rate is several thousand times faster than that of general CVD methods. The discovery and development of the LCVD growth process provide a route for the rapid fabrication of graphene patterns for various applications.

Department(s)

Mechanical and Aerospace Engineering

Keywords and Phrases

Chemical Vapour Deposition; Graphene; Laser Deposition; Nanopatterning; Pulsed Laser Deposition; Radiation Effects

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2011 American Institute of Physics (AIP), All rights reserved.


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