High Performance 1.3 µm InGaAsN:Sb/GaAs Quantum Well Lasers Grown by Molecular Beam Epitaxy
Room-temperature pulsed operation of 1.3 μm InGaAsN:Sb/GaAs quantum well (QW) lasers were grown by solid source molecular beam epitaxy (MBE). Sb was used as a surfactant to enhance the quality of the InGaAsN/GaAs quantum well, resulting in a record low threshold of 1.02 kA/cm². The high temperature characteristics of InGaAsN:Sb/GaAs QW lasers were improved by multiple quantum well (MQW) active layer.
X. Yang et al., "High Performance 1.3 µm InGaAsN:Sb/GaAs Quantum Well Lasers Grown by Molecular Beam Epitaxy," Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, American Institute of Physics (AIP), Jan 2000.
The definitive version is available at https://doi.org/10.1116/1.591409
Mechanical and Aerospace Engineering
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