Overview of the MIDOS Process for Spontaneous Metal Deposition

Author

Jingye Li
Matthew O'Keefe, Missouri University of Science and TechnologyFollow
Thomas J. O'Keefe, Missouri University of Science and TechnologyFollow

Abstract

The MIDOS (Metal Immersion Deposition from Organic Solutions) process refers to a spontaneous metal deposition system similar to cementation or chemical displacement reactions.1 the major difference is that organic solutions are used instead of an aqueous media of the type commonly employed. In addition, the organics used are not good ionic conductors, resulting in high resistance, strongly polarized, localized reactions. Because of these unique characteristics, the possibilities for conducting different types of electrochemical reactions in these organics may offer some attractive alternatives in certain specific applications. Examples of metal plating systems2 that have been demonstrated to produce seed layers and thin films using this new concept are presented.

Recommended Citation

J. Li et al., "Overview of the MIDOS Process for Spontaneous Metal Deposition," Journal of Applied Surface Finishing, National Association for Surface Finishing (NASF), Apr 2006.

Department(s)

Materials Science and Engineering

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2006 National Association for Surface Finishing (NASF), All rights reserved.

Publication Date

01 Apr 2006