Iron Nitride Films Formed in a R. F. Glow Discharge
Fe 2N and Fe 3N films were deposited in an r.f. glow discharge by introducing Fe(CO) 5 and NH 3 into the reactor. The iron nitride films thus formed exhibited sheet conductivities in the range of 10 2-10 3 ohm -1 cm -1. They exhibited microhardness ranging from 578 to 659 kg mm -2 on glass slides. The effects of the deposition temperature and the nature of the substrate material on the structure and composition of the films were investigated. An Fe 4N layer was formed on iron substrates at 400°C in the plasma nitriding process using NH 3 as the gas source. The Fe 4N layer exhibited a microhardness of 230 kg mm -2. The effect of the temperature on the formation of the nitrided layer is discussed. © 1992.
J. L. Li et al., "Iron Nitride Films Formed in a R. F. Glow Discharge," Materials Science and Engineering B, Elsevier, Jan 1992.
The definitive version is available at http://dx.doi.org/10.1016/0921-5107(92)90059-I
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