Microstructure of Fe₇C₃ Formed at 3000°C by Plasma Enhanced Chemical Vapor Deposition (PECVD)
Jonker, B. T. and de Jonge, W. J. M. and Farrow, R. F. C. and Chappert, C. and Clarke, R.
Thin iron carbide films were prepared by introducing iron penta carbonyl (FeCO5) and hydrogen (H2) into a glow discharge. The films are of potential interest in corrosion and wear resistant application. X-ray diffraction data of films (≈7000 Angstrom thick) deposited on glass at 300°C evidenced only Fe7C3. Thinner films were required for examination by analytical and high resolution transmission electron microscopy. Therefore, two sets of films ('thin' <200 Angstrom and “thick” ≈800 Angstrom) were plasma-deposited on carbon or holey carbon films supported on copper girds.
H. Siriwardane et al., "Microstructure of Fe₇C₃ Formed at 3000°C by Plasma Enhanced Chemical Vapor Deposition (PECVD)," Materials Research Society Symposium - Proceedings, Materials Research Society, Jan 1993.
The definitive version is available at http://dx.doi.org/10.1557/PROC-313-691
Materials Research Society Symposium Proceedings (1993, San Francisco, CA, USA)
Materials Science and Engineering
Article - Conference proceedings
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