Title

Fully Integrated Applications of Thin Films on Low Temperature Cofired Ceramic (LTCC)

Abstract

Thin film multilayers hare previously been introduced on multilayer low temperature cofired ceramic (LTCC), as well as initial thin film capacitors on LTCC The ruggedness of a multipurpose Ti/Cu/Pt/Au stack for connectivity and RF conductivity has continued to benefit fabrication and reliability- in state of-the-art modules, while the capacitors have followed the traditional Metal-Insulator-Metal (MIM) style The full integration of thin film passives with thin film connectivity traces is presented. Certain passives, such as capacitors, require specifically tailored and separately patterned thin film (multi-)layers, including a dielectric. Different capacitance values are achieved by variation of both the insulator layer thickness and die active area of the capacitor. Other- passives, such as filter's, require only the conductor - a single thin film multilayer. This can be patterned from the same connectivity thin film material (Ti/Cu/Pt/Au), or a specially tailored thin film material (e.g. Ti/Cu/Au) can be deposited. Both versions are described, including process and integration details. Examples are discussed, ranging from patterning for maximum tolerances, to space and performance-optimized designs. Cross-sectional issues associated with integration are also highlighted in the discussion.

Meeting Name

8th International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies, (2012: Apr. 16-19, Erfurt, Germany)

Department(s)

Materials Science and Engineering

Keywords and Phrases

LTCC; PVD; Thin film; Capacitance values; Low-temperature co-fired ceramics; Metal insulator metals; Patterned thin films; Thin film multilayers; Thin-film capacitors

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2012 International Microelectronics Assembly and Packaging Society, All rights reserved.

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