Thermochemical Nitridation of Microporous Silica Films in Ammonia
Abstract
Microporous silicon dioxide thin films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high-temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents.
Recommended Citation
R. K. Brow and C. G. Pantano, "Thermochemical Nitridation of Microporous Silica Films in Ammonia," Journal of the American Ceramic Society, American Chemical Society (ACS), Jan 1987.
The definitive version is available at https://doi.org/10.1111/j.1151-2916.1987.tb04845.x
Department(s)
Materials Science and Engineering
International Standard Serial Number (ISSN)
0002-7820; 1551-2916
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1987 American Chemical Society (ACS), All rights reserved.
Publication Date
01 Jan 1987
