Masters Theses

Abstract

"Auger electron spectroscopy and mass analysis are used as complementary methods in evaluating desorption kinetics. For phosphorus on silicon, the order of desorption and activation energies of desorption are determined from continuously monitored phosphorus Auger electron signals during heating. These measurements indicate that diatomic phosphorus dissociates when adsorbed onto clean silicon. Mass spectrometer flash desorption spectra show that at least four distinct surface bonds are associated with the desorption of phosphorus. The dominant desorbed species is diatomic phosphorus at high coverage (> 0. 1 monolayer) and atomic phosphorus at low coverage (< 0.07 monolayer)"--Abstract, page ii.

Advisor(s)

Levenson, L. L., 1928-1998

Committee Member(s)

James, William Joseph
Venable, Raymond L., 1935-2008

Department(s)

Chemistry

Degree Name

M.S. in Chemistry

Sponsor(s)

National Science Foundation (U.S.)

Publisher

University of Missouri--Rolla

Publication Date

1973

Pagination

vi, 29 pages

Note about bibliography

Includes bibliographical references (page 21).

Rights

© 1973 Cesar Michel Magnin, All rights reserved.

Document Type

Thesis - Restricted Access

File Type

text

Language

English

Library of Congress Subject Headings

Phosphorus
Surface chemistry
Silicon

Thesis Number

T 2901

Print OCLC #

6019834

Electronic OCLC #

913224762

Link to Catalog Record

Electronic access to the full-text of this document is restricted to Missouri S&T users. Otherwise, request this publication directly from Missouri S&T Library or contact your local library.

http://laurel.lso.missouri.edu/record=b1067047~S5

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