Emission Source Microscopy Technique for EMI Source Localization
For large, complex systems with multiple sources at the same frequency, localizing the sources of radiation often proves difficult. This paper presents an emission source microscopy (ESM) technique derived from synthetic aperture radar (SAR) to localize radiating sources on a PCB. Near-field scanning provides limited information about the components contributing to far-field radiation. This paper presents the source localization methodology, supported by simulation and measurement results. After localizing the sources, the far-field contribution and the total radiated power from each individual source can be estimated. The results show that the proposed method can distinguish between multiple radiating sources on a complex PCB.
P. Maheshwari et al., "Emission Source Microscopy Technique for EMI Source Localization," IEEE Transactions on Electromagnetic Compatibility, vol. 58, no. 3, pp. 729-737, Institute of Electrical and Electronics Engineers (IEEE), Jun 2016.
The definitive version is available at http://dx.doi.org/10.1109/TEMC.2016.2524594
Electrical and Computer Engineering
Keywords and Phrases
Polychlorinated biphenyls; Far-field radiation; Limited information; Microscopy technique; Near-field scanning; Radiating sources; Simulations and measurements; Source localization; Total radiated power; Synthetic aperture radar; Electromagnetic interference (EMI); emission source microscopy
International Standard Serial Number (ISSN)
Article - Journal
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