TLP IV Characterization of a 40 Nm CMOS IO Protection Concept in the Powered State
In this paper, the interaction between the ESD protection concept and a powered output driver in a 40 nm CMOS process are investigated and characterized by TLP. By using IO test chips designed for HBM and CDM validation, the IV behavior of the pin is measured with the driver placed into various states.
B. Orr et al., "TLP IV Characterization of a 40 Nm CMOS IO Protection Concept in the Powered State," Proceedings of the 38th Electrical Overstress/Electrostatic Discharge Symposium (2016, Garden Grove (Anaheim), CA), vol. 2016-October, ESD Association, Oct 2016.
The definitive version is available at http://dx.doi.org/10.1109/EOSESD.2016.7592566
38th Electrical Overstress/Electrostatic Discharge Symposium (2016: Sep. 11-16, Garden Grove (Anaheim), CA)
Electrical and Computer Engineering
Electromagnetic Compatibility (EMC) Laboratory
Keywords and Phrases
CMOS processs; ESD protection; I-V behavior; IV characterization; nocv2; Output drivers; Protection concepts; Test chips; CMOS integrated circuits
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Article - Conference proceedings
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