Abstract

With the recent development of nanoscale materials and assembly techniques, it is envisioned to build high-density reconfigurable systems which have never been achieved by the photolithography. Various reconfigurable architectures have been proposed based on nanowire crossbar structure as the primitive building block. Unfortunately, high-density systems consisting of nanometer-scale elements are likely to have many imperfections and variations; thus, defect-tolerance is considered as one of the most exigent challenges. In this paper, we evaluate three different logic mapping algorithms with defect avoidance to circumvent clustered defective crosspoints in nanowire reconfigurable crossbar architectures. The effectiveness of inherited redundancy and configurability utilization is demonstrated through extensive parametric simulations.

Meeting Name

21st IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (2006: Oct. 4-6, Arlington, VA)

Department(s)

Electrical and Computer Engineering

Keywords and Phrases

Algorithms; Computer Simulation; Crossbar Equipment; Defects; Photolithography; Redundancy, Defect-Tolerance; Nanometer-Scale Elements; Nanowire Crossbar Structure; Reconfigurable Systems; Nanowires

International Standard Book Number (ISBN)

076952706X; 9780769527062

International Standard Serial Number (ISSN)

1550-5774; 2377-7966

Document Type

Article - Conference proceedings

Document Version

Final Version

File Type

text

Language(s)

English

Rights

© 2006 IEEE Computer Society, All rights reserved.

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