The design of silicon-based polyimide as a submicron resolution directly imagable electron-beam resist
Design of silicon based polyimide as a submicron resolution directly imagable electron beam resist
Ph. D. in Chemistry
University of Missouri--Rolla
xii, 157 pages
© 1989 Benjamin Chung-Peng Ho, All rights reserved.
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Full-text not available: Request this publication directly from Missouri S&T Library or contact your local library.http://laurel.lso.missouri.edu/record=b2225474~S5
Ho, Benjamin Chung-Peng, "The design of silicon-based polyimide as a submicron resolution directly imagable electron-beam resist" (1989). Doctoral Dissertations. 717.