An Electrochemical Method for CuO Thin Film Deposition from Aqueous Solution

Abstract

An electrochemical procedure is described for the anodic deposition of CuO thin films from solution precursors at 25-30°C in an alkaline medium (pH > 13). The deposition bath was similar to Fehling's solution using tartrate ions as a complexing agent for Cu(II). Cupric oxide deposited onto a platinum substrate at an anodic current density of 5 mA cm-2 has a preferred orientation of [010]. Rietveld refinement of the powder diffraction pattern reveals pure Cu(II) oxide with no trace of other copper oxides. The suggested mechanism involves the irreversible electrochemical oxidation of the tartrate ligand of the Cu(II) complex leading to the CuO precipitation. The same bath can also be used to deposit Cu₂O films using a cathodic electrodeposition process. In this case, cuprous oxide deposited onto a platinum electrode has a [111] preferred orientation.

Department(s)

Chemistry

International Standard Serial Number (ISSN)

1099-0062

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2003 The Electrochemical Society (ECS), All rights reserved.

Publication Date

01 Jan 2003

Link to Full Text

Share

 
COinS