Epitaxial Electrodeposition of Cu₂O Films onto InP(001)

Author

Run Liu
Eric W. Bohannan, Missouri University of Science and TechnologyFollow
Jay A. Switzer, Missouri University of Science and TechnologyFollow
Fumiyasu Oba
Frank Ernst

Abstract

The exitaxial electrodeposition of Cu₂O films onto InP(001) was discussed. The x-ray diffraction studies indicated a unique epitaxial 45°[001] orientation relationship between Cu₂O and InP. The transmission electron microscopy revealed an amorphous oxygen-rich interlayer between the Cu₂O and the InP crystal, in apparent contradiction to the observation of a unique epitaxial orientation relationship.

Recommended Citation

R. Liu et al., "Epitaxial Electrodeposition of Cu₂O Films onto InP(001)," Applied Physics Letters, American Institute of Physics (AIP), Jan 2003.

The definitive version is available at https://doi.org/10.1063/1.1606503

Department(s)

Chemistry

International Standard Serial Number (ISSN)

0003-6951

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2003 American Institute of Physics (AIP), All rights reserved.

Publication Date

01 Jan 2003