Title

Electrodeposition of Nanomodulated Electronic Ceramic Thin Films

Abstract

Electrochemistry can be used for the atomic-level architecture of ceramic materials. In this report, ceramic superlattices based on the TlaPbbOc/TldPbeOf system were electrodeposited with individual layer thicknesses as thin as 3 nm. The superlattices were deposited from a single aqueous solution at room temperature, and the layer thicknesses were galvanostatically controlled. Substitution of Tl2O3 into PbO2 appears to stabilize a face-centered cubic structure with an average lattice parameter of 0.536 nm. The lattice parameters for the TlaPbbOc mixed oxides vary by less than 0.3% when the Pb/Tl ratio is varied from 0.84 to 7.3. Because the modulation wavelengths are of electron mean free path dimensions, this new class of degenerate semiconductor metal-oxide superlattices may show thickness-dependent quantum optical, electronic, or optoelectronic effects.

Meeting Name

International Conference on the Chemistry of Electronic Ceramic Materials (1990: Aug. 17-22, Jackson, WY)

Department(s)

Chemistry

Keywords and Phrases

Oxides - Mixing; Semiconductor Materials - Optical Properties; Electrodeposition; Metal Oxide Superlattices; Modulated Structures; Nanomodulated Electronic Ceramic Films; Ceramic Materials

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1991 United States Department of Commerce, All rights reserved.

This document is currently not available here.

Share

 
COinS