Scalable Nanomanufacturing of Metasurfaces Using Nanosphere Photolithography
We report on using Nanosphere Photolithography (NPL) for submicron patterning of Frequency Selective Surfaces (FSS). NPL is a combination of two techniques; colloidal nanolithography-where nanospheres form a self-assembled hexagonal close-packed (HCP) array when dispensed on a surface, and photonic jets-which are created when light is incident onto a microsphere in contact with a surface. NPL creates a mask-free HCP hole array in the photoresist. This pattern can be used with evaporation and lift-off to create an array of antenna elements, constituting the FSS. Alternatively, electrodeposition techniques can be used to deposit the metal elements. the later is particularly appealing as it lends itself to reel-to-reel fabrication techniques. Finally, we demonstrate that geometries other than simple hole arrays can be patterned in the photoresist by exposing the microsphere array with off normal incidence light.
J. S. Wilson et al., "Scalable Nanomanufacturing of Metasurfaces Using Nanosphere Photolithography," American Society of Mechnical Engineers (ASME), Jan 2014.
The definitive version is available at http://dx.doi.org/10.1115/IMECE2014-38969
ASME 2014 International Mechanical Engineering Congress and Exposition (2014, Montreal, Canada)
Mechanical and Aerospace Engineering
American Society of Mechnical Engineers (ASME)
Article - Conference proceedings
© 2014 American Society of Mechanical Engineers (ASME), All rights reserved.