Title

A Microstructural Study of Iron Carbides Formed by Plasma-enhanced Chemical Vapor Deposition (50-800nm Thick)

Editor(s)

Jonker, B. T. and de Jonge, W. J. M. and Farrow, R. F. C. and Chappert, C. and Clarke, R.

Abstract

Thin mirror-like iron carbide films were prepared by introducing iron pentacarbonyl [Fe(CO)5] and hydrogen [H2] into a glow discharge. The deposition temperatures were varied from 200-500°C. The iron to carbon ratios of the resulting films were controlled by adjusting the gas flow ratios. The microstructure and phase transformations occurring in these films were studied before and after annealing at 400°C for four hrs. Characterization techniques used included x-ray diffraction, electron diffraction, auger spectroscopy and atomic force microscopy.

Meeting Name

Materials Research Society Symposium Proceedings (1993, San Francisco, CA, USA)

Department(s)

Chemistry

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1993 Materials Research Society, All rights reserved.


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