A Microstructural Study of Iron Carbides Formed by Plasma-enhanced Chemical Vapor Deposition (50-800nm Thick)
Jonker, B. T. and de Jonge, W. J. M. and Farrow, R. F. C. and Chappert, C. and Clarke, R.
Thin mirror-like iron carbide films were prepared by introducing iron pentacarbonyl [Fe(CO)5] and hydrogen [H2] into a glow discharge. The deposition temperatures were varied from 200-500°C. The iron to carbon ratios of the resulting films were controlled by adjusting the gas flow ratios. The microstructure and phase transformations occurring in these films were studied before and after annealing at 400°C for four hrs. Characterization techniques used included x-ray diffraction, electron diffraction, auger spectroscopy and atomic force microscopy.
H. Siriwardane et al., "A Microstructural Study of Iron Carbides Formed by Plasma-enhanced Chemical Vapor Deposition (50-800nm Thick)," Materials Research Society Symposium - Proceedings, Materials Research Society, Jan 1993.
The definitive version is available at http://dx.doi.org/10.1557/PROC-313-425
Materials Research Society Symposium Proceedings (1993, San Francisco, CA, USA)
Article - Conference proceedings
© 1993 Materials Research Society, All rights reserved.