Title

Coatings R&D Notebook

Abstract

The views of Dr. Michael R. Van De Mark, University of Missouri--Rolla, on block resistance, dual-cure technologies for UV, DTM coating adhesion factors and operator drawdown deviation are discussed. Block resistance is the tendency of a coating not to adhere to another surface and the solvent evaporation is the key to block resistance. the adhesion in a direct-to-metal (DTM) coatings can be changed by additives such as defoamers, wetting aids, surfactants and dispersants in usually a negative sense. He is of the view that 1-3% of deviation is typically seen between operators for drawdowns.

Department(s)

Chemistry

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2003 Hitchcock Publishing Co., All rights reserved.

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