New Antireflective Coatings for 193 Nm Lithography
Abstract
New bottom antireflective coatings (BARCs) for 193 nm lithography have been recently developed by Brewer Science Inc. Copolymers of benzyl methacrylate (or benzyl acrylate) and hydroxypropyl methacrylate have been synthesized and used as a main component in 193 nm BARCs. The acrylic copolymers have strong absorbance at 193 nm UV light wavelength. The 193 nm BARCs were formulated in safe solvents such as ethyl lactate and formed by spin-on coating process. Thermosetting of the 193 nm BARCs limited their intermixing with photoresists. These 193 nm BARCs had optical density of about 10 micrometers -1, k equals 0.35, and n equals 1.81. Preliminary oxygen plasma etch rates were > 1.5 times DUV resists. Good profiles at small feature sizes (< 0.20 micrometers) were achieved with tested photoresists. ©2003 Copyright SPIE - The International Society for Optical Engineering.
Recommended Citation
G. Xu et al., "New Antireflective Coatings for 193 Nm Lithography," Proceedings of SPIE - The International Society for Optical Engineering, SPIE -- The International Society for Optical Engineering, Jan 1998.
The definitive version is available at https://doi.org/10.1117/12.312401
Meeting Name
Proceedings of SPIE - The International Society for Optical Engineering (1998, Santa Clara, CA)
Department(s)
Chemistry
Document Type
Article - Conference proceedings
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 1998 SPIE -- The International Society for Optical Engineering, All rights reserved.
Publication Date
01 Jan 1998
