Title

Recent Progress in 193 Nm Antireflective Coatings

Abstract

This paper presents the chemistries and properties of organic, spin-on, bottom antireflective coatings (BARCs) that are designed for 193 nm lithography. All of the BARCs are thermosetting and use dye-attached/incorporated polymers. A first generation product, NEXT, will soon be commercialized. NEXT is built from i-line and deep-UV chemistries with the polymeric constituent being a substituted novolac. This product provides outstanding resolution of 0.16 μm L/S with several 193 nm photoresists. Second generation chemical platforms under study include acrylics, polyesters, and polyethers with the 193 nm absorbing chromophore being an aromatic function. The performance of selected BARCs from the four platforms is described, including: optical properties, 193 nm litho, plasma etch rates, Prolith modeling data, spin-bowl and waste line compatibility, and ambient stability.

Meeting Name

Proceedings of SPIE - The International Society for Optical Engineering (1999, Santa Clara, CA)

Department(s)

Chemistry

Document Type

Article - Conference proceedings

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 1999 SPIE -- The International Society for Optical Engineering, All rights reserved.


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