Abstract
Experiments on deposition of Cu2O films from basic cupper sulfate solution show that copper also deposits. At low, but basic values of pH only copper deposits and at high pH only cuprous oxide deposits. In the intermediate range where both compete the system shows oscillations at "constant current." Linear stability analysis has been conducted for such an electrochemical cell to show that oscillations can take place in the parameter space identified in the experiments. The results are keeping with most of the experimental observations, which are many, but not with all. The physical mechanisms behind the oscillations are explained in terms of competing reactions.
Recommended Citation
P. Neogi, "Interfacial Stability of Electrodeposition of Cuprous Oxide Thin Films," Journal of Chemical Physics, American Institute of Physics (AIP), Nov 2004.
The definitive version is available at https://doi.org/10.1063/1.1803541
Department(s)
Chemical and Biochemical Engineering
Keywords and Phrases
Copper Compounds; Electrochemistry; Electrodeposition; Interface Structure; pH; Thin Films
International Standard Serial Number (ISSN)
0021-9606
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2004 American Institute of Physics (AIP), All rights reserved.
Publication Date
15 Nov 2004
