Title

XPS Characterization of Beryllium Carbide Thin Films Formed via Plasma Deposition

Abstract

Beryllium carbide thin films were deposited onto selected substrates. Such films may serve as inertial confinement fusion target coatings and have potential for magnetic fusion reactors. The films were characterized by X-ray photoelectron spectroscopy (XPS) and four-point probe electrical conductivity measurement (FPPM) among others. XPS analyses established that: (1) beryllium carbide is the dominant chemical composition (2) atomic Be in excess of stoichiometric carbide is dispersed within a carbide matrix and small amount of carbon is present (3) increasing charging shifts in the XPS spectra with decreasing Be content suggests higher electrical resistivity in these films which is confirmed by FPPM of film electrical conductivity.

Department(s)

Chemical and Biochemical Engineering

Second Department

Chemistry

Document Type

Article - Journal

Document Version

Citation

File Type

text

Language(s)

English

Rights

© 2001 Elsevier, All rights reserved.


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